Optics Express- 微焦点 X 射线光栅干涉仪用于光学计量和波前表征-X射线光栅
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Optics metrology and at-wavelength wavefront characterization by a microfocus X-ray grating interferometer
Abstract
A microfocus X-ray grating interferometer (MFXGI) is proposed to measure the profile of the X-ray wavefront and slope error of X-ray optical elements. This device consists of a phase grating G1 to modulate the incoming wavefront and an absorption grating G2 as a transmission mask for the position-sensitive detector. The wavefront distortions caused by the deformable mirror were analyzed under operating conditions for in situ investigation of X-ray optical elements. The MFXGI can obtain direct and reflected beams in one recorded image at the same time through a microfocus X-ray source. The direct beam can be used to calculate the parameter errors and spherical shape for error compensation and retrieve the aspherical shape of the height profile. This instrument is expected to be a valuable tool for further technical progress in X-ray adaptive optics and X-ray mirror manufacturing and mounting.
微焦点 X 射线光栅干涉仪用于光学计量和波前表征
提出了一种微焦点X射线光栅干涉仪（MFXGI）来测量X射线波前的轮廓和X射线光学元件的斜率误差。 该装置由一个相位光栅 G1 和一个吸收光栅 G2 组成，G1用于调制入射波前，G2 作为位置敏感探测器的透射掩模。 由可变形反射镜引起的波前畸变在工作条件下进行了分析，用于 X 射线光学元件的原位研究。 MFXGI 可以通过微焦点 X 射线源在一张记录图像中同时获得直射和反射光束。 直接光束可用于计算参数误差和球面形状以进行误差补偿并检索高度轮廓的非球面形状。 该仪器有望成为 X 射线自适应光学和 X 射线镜制造和安装方面进一步技术进步的宝贵工具。
文章中所使用的光栅是由德国Microworks生产定制、生产的（点击了解详情）。光栅具体参数如下：
相位光栅由环氧树脂在聚酰亚胺基板上制成，间距为p1=5.366μm，厚度为20μm。 G2的间距为p2=3μm，在聚酰亚胺基板上电镀金。