Grating Sets
Designed for Talbot-Lau interferometry and edge illumination imaging from 1 keV to 100 keV, our gratings have produced excellent results for our customers. Gratings are arrays of apertures characteriz
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Designed for Talbot-Lau interferometry and edge illumination imaging from 1 keV to 100 keV, our gratings have produced excellent results for our customers. Gratings are arrays of apertures characterized by the period, the duty cycle (metal width/period), the material height, and the layout area. Microworks can supply gratings with layout sizes ranging from 60 x 20 mm² to 160 x 90 mm². We additionally have experience in stitching/tiling gratings to even larger areas.
See the Spec Sheet below for our standard set of gratings. Custom gratings are available upon request.
Standard Grating Set
design enery | 40KeV |
grating peiod | 6.0 µm |
Layout of G2 | Φ70 mm |
Absorber Material & Height | 金：120 - 160 µm |
Duty Cycle of G0 and G2 | 0.55 |
Duty Cycle of G1 | 0.5 |
Substrate of G0 and G2 | 400µm厚、 4英寸石墨 |
Substrate of G1 | 200µm厚、4英寸、双面抛光硅晶圆 |
We use different substrates for different purposes. For example, polyimide for low-energy applications, silicon for phase gratings, and graphite for absorption gratings.
Our standard set of gratings features 6 µm period parallel lines and is designed for use at 40 keV.
Other Symmetric Grating Sets:
• 8 keV, 2.4 µm period, 50 mm x 50 mm
• 20 keV, 4.8 µm period, diameter: 70 mm
• 55 keV, 8.0 µm period, diameter: 100 mm
Custom Grating Kits:
We offer custom production of grating kits to your specifications.
Options include adaptation to other energies, layout area, 2D gratings (hole arrays for Hartmann sensors), different periods.
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